The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Jun. 15, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Rongping Wang, Cupertino, CA (US);
Ruizhe Ren, Shaanxi, CN;
Jon C. Farr, Tempe, AZ (US);
Chethan Mangalore, Bangalore, IN;
Peter Demonte, Millbrae, CA (US);
Parthiban Balakrishna, Bangalore, IN;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 27/28 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01F 27/28 (2013.01); H01J 37/321 (2013.01); H01J 37/32651 (2013.01); H01J 2237/3341 (2013.01); H01J 2237/3344 (2013.01);
Abstract
Embodiments of the present disclosure include a radial frequency plasma source having a split type inner coil assembly. In one embodiment, the split type inner coil assembly comprises two intertwining coils. In another embodiment, the split type inner coil assembly includes looped coils forming a dome.