Company Filing History:
Years Active: 2004-2014
Title: Innovations of Rosario Mollica
Introduction
Rosario Mollica is a notable inventor based in Wilmington, MA (US), recognized for her contributions to various technological advancements. With a total of seven patents to her name, she has made significant strides in the fields of gasification systems and ion implantation technology.
Latest Patents
One of her latest patents is focused on gasification systems and methods for making bubble-free solutions of gas in liquid. This invention introduces low amounts of gas into a liquid with a fast response time and low variation in concentration. The process involves directing gas into an inlet on a gas contacting side of a porous element while simultaneously directing liquid into an inlet on the liquid contacting side. The result is a dilute bubble-free solution that enhances the efficiency of gas-liquid interactions.
Another significant patent is the ion implanter optimizer scan waveform retention and recovery. This invention provides methods and apparatus for controlling dose uniformity in an ion implantation system. It allows for the adjustment of an initial scan waveform to achieve desired uniformity during implant processes. The technology includes a beam profiler for measuring current distribution and a data acquisition unit for adjusting the scan waveform based on desired parameters.
Career Highlights
Throughout her career, Rosario has worked with Varian Semiconductor Equipment Associates, Inc., where she contributed to the development of advanced semiconductor manufacturing technologies. Her expertise in ion implantation and gasification systems has positioned her as a key player in her field.
Collaborations
Rosario has collaborated with notable professionals such as Joseph C. Olson and Eric D. Hermanson, enhancing her work through shared knowledge and expertise.
Conclusion
Rosario Mollica's innovative patents and career achievements reflect her dedication to advancing technology in her field. Her work continues to influence the development of efficient systems in gasification and ion implantation.