Veldhoven, Netherlands

Ronald Walther Jeanne Severijns

USPTO Granted Patents = 8 

Average Co-Inventor Count = 10.7

ph-index = 5

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 2008-2019

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8 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Ronald Walther Jeanne Severijns

Introduction:

Ronald Walther Jeanne Severijns is a prolific inventor based in Veldhoven, NL, known for his significant contributions to the field of lithographic apparatus and device manufacturing. With an impressive portfolio of 8 patents, Severijns has made a profound impact on the industry through his innovative designs and technologies.

Latest Patents:

Severijns' latest patents include cutting-edge advancements in immersion lithographic projection apparatus. By incorporating both liquidphobic and liquidphilic layers on various elements of the apparatus, Severijns has succeeded in enhancing the efficiency and performance of the equipment. These innovations help prevent the formation of bubbles in the liquid, as well as reduce residue on the elements following contact with the liquid.

Career Highlights:

Currently employed at ASML Netherlands B.V., Severijns continues to push the boundaries of technology in the field of lithography. His expertise and dedication have earned him a reputation as a key player in the development of state-of-the-art manufacturing methods for advanced devices. Severijns' commitment to excellence is evident in his patents and the impact they have on the industry.

Collaborations:

Throughout his career, Severijns has collaborated with talented individuals such as Bob Streefkerk and Johannes Jacobus Matheus Baselmans. These partnerships have not only led to successful projects but have also fostered a culture of innovation and creativity within the industry. By working alongside like-minded professionals, Severijns has been able to drive forward groundbreaking solutions and advancements.

Conclusion:

In conclusion, Ronald Walther Jeanne Severijns stands out as a visionary inventor who continues to shape the future of lithographic apparatus and device manufacturing. His relentless pursuit of excellence and collaborative spirit have positioned him as a leader in the field, inspiring others to strive for innovation and technological advancement. With his remarkable achievements and ongoing contributions, Severijns is undoubtedly a driving force behind the industry's progress.

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