The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Mar. 26, 2009
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Richard Joseph Bruls, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Ronald Walther Jeanne Severijns, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Herman Boom, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Richard Joseph Bruls, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Ronald Walther Jeanne Severijns, Veldhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Herman Boom, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.