Company Filing History:
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Years Active: 2007-2021
Title: Ronald Naumann: Innovator in Semiconductor Technology
Introduction
Ronald Naumann is a distinguished inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor structures.
Latest Patents
One of his latest patents is titled "Semiconductor structure with substantially straight contact profile." This patent relates to semiconductor structures and methods of manufacture that include a block material with an upper oxidized layer at an interface with an insulating material. The interconnect contact structure features a substantially straight profile through the oxidized layer of the block material.
Another notable patent is "Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach." This invention addresses the patterning of strain-inducing dielectric material layers above transistors of different conductivity types. It emphasizes a process sequence that avoids the negative influence of fluorine species in an oxygen plasma during the removal of the resist mask, potentially applying a substantially oxygen-free plasma process for this purpose.
Career Highlights
Ronald Naumann has worked with prominent companies in the semiconductor industry, including GlobalFoundries U.S. Inc. and GlobalFoundries Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Throughout his career, Ronald has collaborated with notable professionals in the field, including Volker Grimm and Matthias Zinke. These collaborations have contributed to the advancement of semiconductor technologies and innovations.
Conclusion
In summary, Ronald Naumann is a key figure in semiconductor innovation, with a focus on improving semiconductor structures and transistor performance. His patents reflect his commitment to advancing technology in this critical field.