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For the Inventor, By the Inventor

Pleasanton, CA, United States of America

Robert W Wu

USPTO Granted Patents = 26

Average Co-Inventor Count = 3.7

ph-index = 17

Forward Citations = 1,088(Granted Patents)


Company Filing History:

goldMedal24 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal2 out of 832,680 
Other
 patents

Years Active: 1993-2004

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26 patents (USPTO):
1. 6800213 - Precision dielectric etch using hexafluorobutadiene (2004-10-05),
2. 6776873 - Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers (2004-08-17),
3. 6513452 - Adjusting DC bias voltage in plasma chamber (2003-02-04),
4. 6454898 - Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners (2002-09-24),
5. 6432318 - Dielectric etch process reducing striations and maintaining critical dimensions (2002-08-13),
6. 6379574 - Integrated post-etch treatment for a dielectric etch process (2002-04-30),
7. 6361705 - Plasma process for selectively etching oxide using fluoropropane or fluoropropylene (2002-03-26),
8. 6308654 - Inductively coupled parallel-plate plasma reactor with a conical dome (2001-10-30),
9. 6221782 - Adjusting DC bias voltage in plasma chamber (2001-04-24),
10. 6183655 - Tunable process for selectively etching oxide using fluoropropylene and a hydrofluorocarbon (2001-02-06),
11. 6074959 - Method manifesting a wide process window and using hexafluoropropane or (2000-06-13),
12. 6074512 - Inductively coupled RF plasma reactor having an overhead solenoidal (2000-06-13),
13. 6009830 - Independent gas feeds in a plasma reactor (2000-01-04),
14. 5986875 - Puncture resistant electrostatic chuck (1999-11-16),
15. 5965463 - Silane etching process (1999-10-12),

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Title: The Innovative Journey of Robert W Wu

Introduction: Robert W Wu, a prolific inventor based in Pleasanton, CA, has made significant contributions to the field of semiconductor processing through his creative patents and groundbreaking solutions.

Latest Patents: Wu's latest patents showcase his expertise in semiconductor technologies. One of his recent inventions is the "Precision dielectric etch using hexafluorobutadiene," which details an advanced oxide etching recipe for semiconductor applications. Another notable patent is the "Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers," aimed at enhancing chamber material performance against plasma attacks.

Career Highlights: With an impressive portfolio of 26 patents, Wu has established himself as a leading innovator in the industry. He has been associated with renowned companies such as Applied Materials, Inc., where he has played a pivotal role in driving technological advancements in semiconductor manufacturing.

Collaborations: Throughout his career, Wu has collaborated with industry experts like Gerald Z Yin and Hongching Shan. These collaborations have led to the development of cutting-edge solutions and technologies that have redefined semiconductor processing standards.

Conclusion: Robert W Wu's relentless pursuit of innovation and his groundbreaking inventions have significantly contributed to advancements in semiconductor processing. His pioneering work continues to inspire future generations of inventors and innovators in the field.

I hope this article provides valuable insights into the remarkable contributions of Robert W Wu in the realm of innovations and inventions. If you need further information or assistance, feel free to ask!

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