The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Jun. 07, 2002
Ji Ding, Fremont, CA (US);
Hidehiro Kojiri, Narita, Chiba, JP;
Yoshio Ishikawa, Narita, Chiba, JP;
Keiji Horioka, Utase, Mihama-ku, Chiba, JP;
Ruiping Wang, Fremont, CA (US);
Robert W. Wu, Pleasanton, CA (US);
Hoiman (Raymond) Hung, San Jose, CA (US);
Other;
Abstract
An oxide etching recipe including a heavy hydrogen-free fluorocarbon having F/C ratios less than 2, preferably C F , an oxygen-containing gas such as O or CO, a lighter fluorocarbon or hydrofluorocarbon, and a noble diluent gas such as Ar or Xe. The amounts of the first three gases are chosen such that the ratio (F—H)/(C—O) is at least 1.5 and no more than 2. Alternatively, the gas mixture may include the heavy fluorocarbon, carbon tetrafluoride, and the diluent with the ratio of the first two chosen such the ratio F/C is between 1.5 and 2.