Ji Ding

Title: The Innovative Contributions of Ji Ding

Introduction

Ji Ding is a prominent inventor based in Newark, California, known for his significant contributions to the field of semiconductor manufacturing. With a total of six patents to his name, Ji has made remarkable advancements in dielectric etching processes, which are crucial for the production of integrated circuits.

Latest Patents

Among Ji Ding's latest patents is a precision dielectric etch using hexafluorobutadiene. This innovative oxide etching recipe incorporates a heavy hydrogen-free fluorocarbon with F/C ratios less than 2, along with an oxygen-containing gas such as O2 or CO, a lighter fluorocarbon or hydrofluorocarbon, and a noble diluent gas like Ar or Xe. The specific amounts of these gases are carefully selected to ensure that the ratio (F—H)/(C—O) remains between 1.5 and 2. Another notable patent involves a dielectric etch process that reduces striations while maintaining critical dimensions. This recipe also utilizes a heavy hydrogen-free fluorocarbon, an oxygen-containing gas, and a noble diluent gas, with similar gas ratio requirements to achieve optimal results.

Career Highlights

Ji Ding has had a successful career, working with leading companies in the semiconductor industry, including Applied Materials, Inc. His expertise in etching processes has positioned him as a valuable asset in the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Ji has collaborated with notable professionals in the field, including Hongching Shan and Michael D Welch. These collaborations have further enhanced his innovative capabilities and contributed to the success of his projects.

Conclusion

Ji Ding's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of advanced technologies in the industry.