Austin, TX, United States of America

Robert Paiz


Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 139(Granted Patents)


Company Filing History:


Years Active: 1998-2004

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17 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Robert Paiz

Introduction

Robert Paiz is a notable inventor based in Austin, TX (US), recognized for his significant contributions to the field of semiconductor technology. With a total of 17 patents to his name, Paiz has made remarkable advancements that have influenced the industry.

Latest Patents

One of his latest patents is titled "Method of making enhanced trench oxide with low temperature nitrogen integration." This invention involves a sophisticated process for creating an improved isolation trench between active regions within a semiconductor substrate. The method includes forming a nitride layer on a silicon substrate, patterning a photoresist layer, and etching to create isolation trenches. The incorporation of nitrogen into a trench liner to form an oxynitride layer is a key aspect of this innovation. Another significant patent is "Integrated formation of LDD and non-LDD semiconductor devices." This method describes the formation of semiconductor devices with varying gate dielectrics and dopant implantation techniques, enhancing the performance and efficiency of the devices.

Career Highlights

Throughout his career, Robert Paiz has worked with prominent companies, including Advanced Micro Devices Corporation. His work has been pivotal in advancing semiconductor technologies, contributing to the development of more efficient and effective devices.

Collaborations

Paiz has collaborated with notable professionals in the field, including Mark I Gardner and Thomas E Spikes, Jr. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Robert Paiz's innovative contributions to semiconductor technology have established him as a significant figure in the industry. His patents reflect a deep understanding of complex processes and a commitment to advancing technology.

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