Robert Jeffrey Wade

Title: The Innovations of Robert Jeffrey Wade

Introduction

Robert Jeffrey Wade is an accomplished inventor based in Stamford, CT (US). He is known for his significant contributions to the field of lithography apparatuses. With a focus on reducing vibrations in reticle handling, Wade has developed innovative solutions that enhance the performance of lithographic systems.

Latest Patents

Wade holds a patent for a "Reticle Gripper Damper and Isolation System for Lithographic Apparatuses." This invention describes methods, devices, and systems designed to handle reticles while minimizing vibrations in a reticle handler. The apparatus includes a reticle handler arm, a reticle baseplate, and a gripper that connects the baseplate to the arm. The gripper features a static structure coupled to the arm, an isolation structure, and damping elements that work together to reduce vibrations effectively.

Career Highlights

Throughout his career, Wade has worked with notable companies such as ASML Holding N.V. and ASML Netherlands B.V. His experience in these organizations has allowed him to refine his expertise in lithography technology and contribute to advancements in the field.

Collaborations

Wade has collaborated with esteemed colleagues, including Roberto B. Wiener and Peter Conrad Kochersperger. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Robert Jeffrey Wade's contributions to lithography technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the efficiency and effectiveness of lithographic systems.