Asml Holding N.v.

Asml Netherlands B.v.

Robert Jeffrey Wade

Boris Kogan

Peter Conrad Kochersperger

Roberto B Wiener

Martinus Agnes Willem Cuijpers

George Hilary Harrold

Shaun Evans

Matthew Boudreau

Systems, apparatuses, and methods are provided for transporting a reticle chamber (pod) for processing. In one example, a system for transporting the pod is disclosed. The system may include a moving apparatus, abase coupled to the moving apparatus, and a gripping ring extending from the base. In some aspects, the gripping ring grips a flange extending from the pod. The moving apparatus moves the base in response to the gripping ring gripping the flange.

Pod handling systems and methods for a lithographic device

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

Reticle gripper damper and isolation system for lithographic apparatuses

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Stamford, CT, United States of America

Robert Jeffrey Wade