This inventor holds 6 USPTO granted patents. Top assignees: Synopsys, Inc., Hewlett-Packard Company, Agilent Technologies, Inc.. Active years: 1991-2014.
Company Filing History:
3 out of 2,592 
2 out of 9,639 
1 out of 4,728 Years Active: 1991-2014
Title: The Innovations of Robert E. Gleason
Introduction
Robert E. Gleason is a notable inventor based in San Carlos, CA (US), recognized for his contributions to the field of photo-lithography. With a total of 6 patents, his work has significantly impacted the technology used in semiconductor manufacturing.
Latest Patents
Gleason's latest patents include a technique for determining calibration parameters for a lithographic process. This innovative method utilizes images of a test pattern produced by the photo-lithographic process to establish corresponding sets of calibration parameters. These images are associated with at least three different focal planes in an optical system, allowing for enhanced simulations of the photolithographic process. Another significant patent is the full-field mask error enhancement function, which determines a full-field Mask Error Enhancement Function (MEEF) related to a mask pattern used in photo-lithography. This technique generates simulated wafer patterns and calculates MEEF values in multiple directions, providing critical insights into feature dimensions.
Career Highlights
Throughout his career, Robert E. Gleason has worked with prominent companies such as Synopsys, Inc. and Hewlett-Packard Company. His experience in these organizations has allowed him to refine his expertise in photo-lithographic processes and contribute to advancements in the field.
Collaborations
Gleason has collaborated with talented individuals, including Kit M. Cham and Xin Zhou, further enhancing the innovative work produced in his patents.
Conclusion
Robert E. Gleason's contributions to photo-lithography through his patents and collaborations highlight his significant role in advancing technology in the semiconductor industry. His innovative techniques continue to influence the field and pave the way for future developments.