Company Filing History:
Years Active: 2000-2007
Title: **Innovative Contributions of Robert C. Vail**
Introduction
Robert C. Vail is a notable inventor based in Windsor, California, recognized for his contributions to the field of semiconductor technology. With a total of 8 patents to his name, Vail has made significant advancements, particularly in the design and functionality of plasma etch reactors.
Latest Patents
Among his latest innovations, Vail developed a plasma etch reactor and method that features an upper electrode, a lower electrode, and a peripheral ring electrode positioned between them. This reactor is uniquely designed with the upper electrode grounded while the peripheral electrode utilizes a high-frequency AC power supply, and the lower electrode operates with both a low-frequency AC power supply and a DC power supply. The configuration includes a solid source of gaseous species and a protruding baffle, enabling a nozzle to deliver a jet stream of process gases. This ensures uniformity of the process gases at the surface of a semiconductor wafer. The innovative configuration enhances the range of densities for plasma within the reactor, allowing for greater flexibility through the adjustment of the power supplies.
Career Highlights
Robert C. Vail has spent a significant portion of his career at Tegal Corporation, where he has been instrumental in pushing the boundaries of semiconductor processing technologies. His work has not only enhanced the performance of semiconductor fabrication but has also contributed to the advancement of production efficiency in the industry.
Collaborations
Throughout his career, Vail has collaborated with talented individuals such as Stephen P. DeOrnellas and Alferd Cofer. These partnerships have been essential in fostering an environment of innovation and creativity, further advancing the technologies associated with plasma processing in semiconductors.
Conclusion
Robert C. Vail's contributions to the field of semiconductor technology through his numerous patents and collaborations demonstrate his pivotal role as an inventor. His innovations, particularly in plasma etch reactors, continue to influence and improve semiconductor fabrication processes. As the industry evolves, Vail's work remains a crucial component of technological advancement in this dynamic field.