London, United Kingdom

Robert A Falster


Average Co-Inventor Count = 6.5

ph-index = 6

Forward Citations = 80(Granted Patents)


Location History:

  • Milan, IT (1999 - 2003)
  • London, GB (2002 - 2005)

Company Filing History:


Years Active: 1999-2005

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8 patents (USPTO):Explore Patents

Title: The Innovations of Robert A. Falster

Introduction

Robert A. Falster is a notable inventor based in London, GB, recognized for his significant contributions to the field of silicon technology. With a total of 8 patents to his name, he has made remarkable advancements in the processes related to single crystal silicon growth.

Latest Patents

Falster's latest patents include innovative processes aimed at enhancing the quality of silicon materials. One of his notable inventions is a process for growing a single crystal silicon that controls growth velocity and temperature gradients. This process results in a first axially symmetrical region that is predominantly free of agglomerated intrinsic point defects. Another significant patent involves the development of a low defect density epitaxial wafer, which comprises a single crystal silicon substrate and an epitaxial layer. This invention focuses on creating a substrate that is free of agglomerated intrinsic point defects, ensuring high-quality silicon materials.

Career Highlights

Falster is currently associated with MEMC Electronic Materials, Inc., where he continues to innovate in the field of semiconductor materials. His work has been instrumental in advancing the technology used in various electronic applications.

Collaborations

Throughout his career, Falster has collaborated with esteemed colleagues such as Joseph C. Holzer and Steve A. Markgraf, contributing to the development of cutting-edge technologies in silicon processing.

Conclusion

Robert A. Falster's contributions to silicon technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative processes continue to influence the semiconductor industry and pave the way for future advancements.

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