Sagamihara, Japan

Risa Nakase


Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 2000-2004

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7 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Risa Nakase

Introduction

Risa Nakase is a remarkable inventor based in Sagamihara, Japan, known for her contributions to the field of thin-film deposition technology. With an impressive portfolio of seven patents, she has made significant strides in enhancing semiconductor manufacturing processes. Her innovative spirit and technical expertise make her a prominent figure in the realm of materials science.

Latest Patents

Among Risa's latest patents is a groundbreaking method for forming films using plasma. This plasma thin-film deposition method utilizes cyclic CF gas and hydrocarbon gas, such as CH gas, which are activated under specific pressures to deposit a CF film on semiconductor wafers. The process occurs at a temperature of 400°C, utilizing active species from the gases. Additionally, she has devised a method where cyclic CF gas, activated as plasma at a pressure of approximately 0.06 Pa, serves as a thin-film deposition gas for the same purpose, showcasing her innovative approaches in the semiconductor manufacturing industry.

Career Highlights

Risa Nakase currently works with Tokyo Electron Limited, a leading company dedicated to developing innovative technology for semiconductor manufacturing and flat panel display. Her contributions at the company reflect her commitment to advancing the field and improving productivity in semiconductor fabrication.

Collaborations

Throughout her career, Risa has collaborated with several talented individuals, including Takashi Akahori and Shuichi Ishizuka. These collaborations have enabled her to exchange ideas and innovate further, enhancing the effectiveness of her research and development efforts.

Conclusion

In summary, Risa Nakase is a distinguished inventor whose innovative patents have the potential to revolutionize semiconductor manufacturing processes. With her continued work at Tokyo Electron Limited and her strong collaborations, she is set to leave a lasting impact on the field of materials science and technology. Her journey serves as an inspiration to aspiring inventors and engineers worldwide.

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