The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Jul. 10, 1998
Takashi Akahori, Hachioji, JP;
Masaki Tozawa, Fussa, JP;
Yoko Naito, Sagamihara, JP;
Risa Nakase, Sagamihara, JP;
Osamu Yokoyama, Sagamihara, JP;
Shuichi Ishizuka, Kanagawa-ken, JP;
Shunichi Endo, Sagamihara, JP;
Masahide Saito, Setagawa-Ku, JP;
Takeshi Aoki, Hachioji, JP;
Tadashi Hirata, Sagamihara, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
Microwave is introduced into a plasma chamber of a plasma processing apparatus and magnetic field is applied thereto to allow plasma generation gas to be placed in plasma state by the electron cyclotron resonance. This plasma is introduced into a film forming chamber of the plasma processing apparatus to allow film forming gas including compound gas of carbon and fluorine or compound gas of carbon, fluorine and hydrogen, and hydro carbon gas to be placed in plasma state. In addition, an insulating film consisting of fluorine added carbon film is formed by the film forming gas placed in plasma state.