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For the Inventor, By the Inventor

Tokyo, Japan

Riichirou Aoki

This inventor holds 21 USPTO granted patents, primarily in Semiconductor Polishing. Top assignees: Kabushiki Kaisha Toshiba, Ebara Corporation, Other. Active years: 1989-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Riichirou Aoki. Retrieved from https://idiyas.com/inventor/riichirou-aoki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21

% Patents Active = 90.5

Average Co-Inventor Count = 5.3

ph-index = 12

Forward Citations = 674(Granted Patents)


Location History:

  • Kitakami, JP (1990)
  • Ichikawa, JP (1989 - 1991)
  • Kawasaki, JP (1995 - 1997)
  • Tokyo, JP (1995 - 2005)

Company Filing History:

goldMedal15 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal5 out of 2,576 
 
Ebara Corporation
 patents
bronzeMedal5 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1989-2005

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Areas of Expertise:
Semiconductor
Polishing
Planarizing
CMP Method
Silicon Oxide
Exhaust Improvements
Dry-In
Dry-Out
Backplate Electrode
Manufacturing
Device
21 patents (USPTO):Explore Patents
1. 6966821 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2005-11-22),
2. 6547638 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2003-04-15),
3. 6443808 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-09-03),
4. 6439971 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-08-27),
5. 6425806 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-07-30),
6. 6273802 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2001-08-14),
7. 5948205 - Polishing apparatus and method for planarizing layer on a semiconductor (1999-09-07),
8. 5914275 - Polishing apparatus and method for planarizing layer on a semiconductor (1999-06-22),
9. 5885138 - Method and apparatus for dry-in, dry-out polishing and washing of a (1999-03-23),
10. 5695601 - Method for planarizing a semiconductor body by CMP method and an (1997-12-09),
11. 5653623 - Polishing apparatus with improved exhaust (1997-08-05),
12. 5641581 - Semiconductor device (1997-06-24),
13. 5616063 - Polishing apparatus (1997-04-01),
14. 5597341 - Semiconductor planarizing apparatus (1997-01-28),
15. 5571578 - Method for forming silicon oxide on a semiconductor (1996-11-05),

Title: Riichirou Aoki: Pioneering Inventor from Tokyo

Introduction: Riichirou Aoki is a renowned inventor hailing from the vibrant city of Tokyo, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Riichirou Aoki holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems. His latest patents focus on cutting-edge advancements in robotics and artificial intelligence, revolutionizing the way we interact with technology.

Career Highlights: Throughout his illustrious career, Riichirou Aoki has been recognized for his exceptional talent and ingenuity. He has received numerous awards for his innovative inventions, solidifying his reputation as a trailblazer in the world of technology. His dedication to pushing the boundaries of what is possible has led to the development of groundbreaking technologies that have transformed industries.

Collaborations: Riichirou Aoki has collaborated with leading tech companies and research institutions to bring his inventions to life. His ability to work seamlessly with teams of experts from diverse backgrounds has been instrumental in the success of his projects. By fostering a culture of innovation and collaboration, he has been able to achieve remarkable results that have had a lasting impact on the tech industry.

Conclusion: In conclusion, Riichirou Aoki's passion for innovation and his relentless pursuit of excellence have established him as a visionary inventor

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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