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For the Inventor, By the Inventor

Boise, ID, United States of America

Richard T Housley

USPTO Granted Patents = 20 

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Plympton, MA (US) (2014)
  • Boise, ID (US) (2011 - 2023)

Company Filing History:

goldMedal15 out of 37,905 
 
Micron Technology Incorporated
 patents
silverMedal4 out of 2,305 
 
Nan Ya Technology Corporation
 patents
bronzeMedal1 out of 832,680 
Other
 patents

Years Active: 2011-2025

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20 patents (USPTO):
1. 12230546 - Wafer registration and overlay measurement systems and related methods (2025-02-18),
2. 11784077 - Wafer overlay marks, overlay measurement systems, and related methods (2023-10-10),
3. 11520240 - Wafer alignment markers, systems, and related methods (2022-12-06),
4. 11251096 - Wafer registration and overlay measurement systems and related methods (2022-02-15),
5. 11075169 - Integrated-circuitry overlay alignment mark, a substrate comprising an overlay alignment mark, a method of forming an overlay alignment mark in the fabrication of integrated circuitry, and a method of determining overlay alignment in the fabrication of integrated circuitry (2021-07-27),
6. 11009798 - Wafer alignment markers, systems, and related methods (2021-05-18),
7. 10756022 - Methods of alignment marking semiconductor wafers, and semiconductor packages having portions of alignment markings (2020-08-25),
8. 10461038 - Methods of alignment marking semiconductor wafers, and semiconductor packages having portions of alignment markings (2019-10-29),
9. 9343114 - Memory arrays and methods of forming electrical contacts (2016-05-17),
10. 9324721 - Pitch-halving integrated circuit process (2016-04-26),
11. 9245844 - Pitch-halving integrated circuit process and integrated circuit structure made thereby (2016-01-26),
12. 8796786 - Memory arrays and methods of forming electrical contacts (2014-08-05),
13. 8796086 - Methods of forming an array of memory cells, methods of forming a plurality of field effect transistors, methods of forming source/drain regions and isolation trenches, and methods of forming a series of spaced trenches into a substrate (2014-08-05),
14. 8779918 - Convulsive seizure detection and notification system (2014-07-15),
15. 8674522 - Castle-like chop mask for forming staggered datalines for improved contact isolation and pattern thereof (2014-03-18),

Title: **Richard T. Housley: Innovator in Wafer Measurement Systems**

Introduction

Richard T. Housley is a notable inventor based in Boise, ID, renowned for his contributions to the field of wafer measurement systems. With an impressive portfolio of 19 patents, Housley has made significant advancements in measuring overlay and registration on semiconductor wafers, which are critical in the manufacturing of microelectronics.

Latest Patents

Housley's recent patents focus on innovative methodologies for measuring overlays and improving the accuracy of wafer registration. One of his notable inventions involves a method for measuring overlay between an interest level and a reference level of a wafer. This process includes applying a magnetic field to the wafer, detecting residual magnetic fields, and determining the locations of registration markers to calculate positional offsets.

Another significant patent describes an overlay measurement system that aligns a wafer to capture images of overlay marks efficiently. The method involves orienting the wafer to optimize light emission directions, capturing images through an imager sensor, and analyzing the contrasts of the overlay mark's regions, which helps determine their precise locations.

Career Highlights

Throughout his career, Richard T. Housley has worked with prominent companies in the semiconductor industry, including Micron Technology Incorporated and Nan Ya Technology Corporation. His technical expertise and innovative thinking have influenced various projects and developments in these organizations.

Collaborations

Housley has collaborated with esteemed professionals in his field, such as David S. Pratt and Neal L. Davis. These partnerships have fostered an environment of collaboration and innovation, leading to groundbreaking advancements in wafer measurement technologies.

Conclusion

Richard T. Housley continues to push the boundaries of innovation in the semiconductor industry. His 19 patents, particularly in wafer registration and overlay measurement systems, exemplify his commitment to advancing technology and improving manufacturing processes. As he continues to work and collaborate with other industry professionals, Housley's contributions will undoubtedly influence the future of microelectronics.

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