Sandy, OR, United States of America

Richard K Lyons

USPTO Granted Patents = 3 

Average Co-Inventor Count = 9.7

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2010-2017

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Richard K. Lyons

Introduction

Richard K. Lyons is a notable inventor based in Sandy, Oregon. He has made significant contributions to the field of technology, particularly in wafer alignment systems and electroless plating processes. With a total of 3 patents to his name, Lyons has demonstrated a commitment to innovation and advancement in his field.

Latest Patents

One of his latest patents is the "Vision-based wafer notch position measurement." This invention involves a wafer alignment system that utilizes an image capture device to analyze the position of a wafer on a pedestal. The system calculates angular offsets based on the detected notch in the wafer's edge, ensuring precise transfer to a process cell. Another significant patent is the "Electroless plating-liquid system," which features a main reservoir for reactant liquid and a reaction vessel connected by a feed conduit. This system includes a microwave heater to preheat the reactant liquid and a recycle conduit to maintain optimal conditions for the substrate treatment.

Career Highlights

Throughout his career, Richard K. Lyons has worked with prominent companies in the technology sector, including Novellus Systems Incorporated and Lam Research Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.

Collaborations

Lyons has collaborated with talented individuals such as Christopher M. Bartlett and Jingbin Feng. These partnerships have likely enhanced his innovative capabilities and led to the development of his patents.

Conclusion

Richard K. Lyons is a distinguished inventor whose work has significantly impacted the technology industry. His patents reflect a deep understanding of complex systems and a dedication to improving processes. His contributions continue to influence advancements in wafer alignment and plating technologies.

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