Company Filing History:

10 out of 13,684

Applied Materials, Inc.

Years Active: 2004-2012

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8281738 - Cathode and counter-cathode arrangement in an ion source (2012-10-09),

2. 7875125 - Method for extending equipment uptime in ion implantation (2011-01-25),

3. 7838850 - External cathode ion source (2010-11-23),

4. 7655924 - Front plate for an ion source (2010-02-02),

5. 7586101 - Ion sources for ion implantation apparatus (2009-09-08),

6. 7573051 - Ion beam guide tube (2009-08-11),

7. 7518124 - Monatomic dopant ion source and method (2009-04-14),

8. 7205552 - Monatomic boron ion source and method (2007-04-17),

9. 7087913 - Ion implanter electrodes (2006-08-08),

10. 6905947 - Monatomic boron ion source and method (2005-06-14),

11. 6847043 - Ion sources for ion implantation apparatus (2005-01-25),

12. 6777882 - Ion beam generator (2004-08-17),

Title: The Innovative Journey of Richard David Goldberg

Introduction:

Richard David Goldberg, a brilliant inventor hailing from Hove, GB, has made significant contributions to the field of ion sources and ion implantation technologies. With an impressive portfolio of 12 patents, his groundbreaking inventions have revolutionized the semiconductor industry.

Latest Patents:

1. Cathode and counter-cathode arrangement in an ion source

Richard's patented invention focuses on optimizing ion sources for ion implanters by introducing a cathode and counter-cathode arrangement. This setup enhances the efficiency of ion production, enabling precise semiconductor wafer implantation.

2. Method for extending equipment uptime in ion implantation

Another one of Richard's remarkable patents unveils a novel in-situ cleaning process for ion sources and extraction electrodes. By chemically removing carbon deposits, this method enhances the service lifetime and performance of ion-beam producing systems, reducing downtime significantly.

Career Highlights:

Richard David Goldberg has left his mark on renowned companies such as Applied Materials, Inc. and Semequip, Inc., where his expertise was invaluable in driving innovation and pushing boundaries in semiconductor manufacturing technologies. His strategic vision and technical prowess have paved the way for cutting-edge advancements in the industry.

Collaborations:

Throughout his career, Richard has collaborated with esteemed professionals like David George Armour and Christopher Burgess. Together, they have synergized their skills and knowledge to tackle complex technological challenges, leading to the successful development of groundbreaking inventions.

Conclusion:

In conclusion, Richard David Goldberg stands as a trailblazer in the realm of ion sources and ion implantation technologies. His inventive spirit, coupled with his unwavering dedication to innovation, continues to shape the landscape of the semiconductor industry. With a legacy of pioneering patents and successful collaborations, Richard exemplifies the true essence of a visionary inventor.

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