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Richard D Holscher

This inventor holds 33 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Semiconductor Processing. Top assignees: Micron Technology Incorporated, Aptina Imaging Corporation, Semiconductor Components Industries, LLC. Active years: 2000-2016.

USPTO Granted Patents = 33 (Patent Applications = 1)

% Patents Active = 60.6

EPO Patents = 1

Average Co-Inventor Count = 2.1

ph-index = 8

Forward Citations = 418(Granted Patents)

Company Filing History:

29 out of 39,149

Micron Technology Incorporated

patents

2 out of 580

Aptina Imaging Corporation

patents

2 out of 3,716

Semiconductor Components Industries, LLC

patents

Years Active: 2000-2016

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Areas of Expertise:

Semiconductor Constructions

Color Filter Array

Image Systems

Crosstalk Reduction

Capacitor Structures

Photomasks

Lithography

Overlay Target Design

DRAM Arrays

Anti-Reflective Coatings

Radial Processing Uniformity

Fluorescence Detection

33 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9240427 - CFA resist silylation for limiting color interactions and improving crosstalk (2016-01-19),

2. 9172892 - Imaging systems with image pixels having varying light collecting areas (2015-10-27),

3. 8878969 - Imaging systems with color filter barriers (2014-11-04),

4. 7825443 - Semiconductor constructions (2010-11-02),

5. 7821142 - Intermediate semiconductor device structures (2010-10-26),

6. 7804115 - Semiconductor constructions having antireflective portions (2010-09-28),

7. 7799491 - Color filter array and imaging device containing such color filter array and method of fabrication (2010-09-21),

8. 7626238 - Semiconductor devices having antireflective material (2009-12-01),

9. 7576400 - Circuitry and gate stacks (2009-08-18),

10. 7538036 - Methods of forming openings, and methods of forming container capacitors (2009-05-26),

11. 7408265 - Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates (2008-08-05),

12. 7321149 - Capacitor structures, and DRAM arrays (2008-01-22),

13. 7153778 - Methods of forming openings, and methods of forming container capacitors (2006-12-26),

14. 6878507 - Semiconductor processing methods (2005-04-12),

15. 6815308 - Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates (2004-11-09),

Title: The Innovative Journey of Richard D Holscher

Introduction: Richard D Holscher, a pioneering inventor based in Boise, ID (US), has made significant contributions to the field of innovations with his creative mindset and dedication to technological advancement.

Latest Patents: Richard D Holscher holds several patents in various industries, showcasing his versatility and ingenuity in inventing cutting-edge solutions to complex problems.

Career Highlights: Throughout his illustrious career, Richard D Holscher has been at the forefront of innovation, consistently pushing the boundaries of what is possible. His passion for creating novel inventions has led to groundbreaking developments in multiple sectors.

Collaborations: Richard D Holscher has collaborated with leading research institutions, universities, and companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the successful implementation of numerous innovative projects.

Conclusion: Richard D Holscher's remarkable journey as an inventor exemplifies the power of creativity and perseverance in driving technological progress. His impact on the world of innovations is truly inspiring, and his legacy will continue to shape the future of invention for years to come.

Profile summary based on public USPTO records.

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