Company Filing History:
Years Active: 2009-2010
Title: Richard Appel: Innovator in Plasma Doping Technology
Introduction
Richard Appel is a notable inventor based in Danvers, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in plasma doping systems. With a total of 2 patents, his work focuses on enhancing the precision of dopant profiles in semiconductor manufacturing.
Latest Patents
Richard Appel's latest patents include innovative methods for profile adjustment in plasma ion implanters. The first patent describes a method to provide a dopant profile adjustment solution in plasma doping systems, ensuring that both concentration and junction depth requirements are met. This method involves bias ramping and bias ramp rate adjustments to achieve desired dopant profiles, which are critical for device scaling. The second patent also addresses profile adjustment in plasma ion implanters, detailing a method and apparatus that facilitate the realization of shallow and abrupt junctions in both vertical and lateral directions.
Career Highlights
Richard Appel is currently employed at Varian Semiconductor Equipment Associates, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of plasma doping systems, contributing to the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Richard has collaborated with talented individuals such as Ziwei Fang and Vincent Deno. These collaborations have fostered innovation and have played a crucial role in the development of new technologies in the semiconductor industry.
Conclusion
In summary, Richard Appel is a distinguished inventor whose work in plasma doping technology has significantly impacted the semiconductor industry. His innovative patents and collaborations continue to drive advancements in this critical field.