Rishon Lezion, Israel

Reuven Katraro

USPTO Granted Patents = 19 

 

Average Co-Inventor Count = 4.0

ph-index = 10

Forward Citations = 443(Granted Patents)


Location History:

  • Rishon Letzion, IL (1997 - 2007)
  • Rishon Lezion, IL (1991 - 2018)

Company Filing History:


Years Active: 1991-2018

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19 patents (USPTO):Explore Patents

Title: The Innovations of Reuven Katraro

Introduction

Reuven Katraro, an accomplished inventor based in Rishon Lezion, Israel, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 19 patents, Katraro continues to innovate and advance the capabilities of electronic devices.

Latest Patents

Among his latest innovations is a groundbreaking semiconductor device featuring trench-like feed-throughs. This design includes a substrate layer that is separated from a drain contact by an intervening layer. The trench-like feed-through elements serve to electrically connect the drain contact and the substrate layer during operation, enhancing the efficiency and performance of the device.

Career Highlights

Throughout his career, Reuven Katraro has worked with prominent companies in the technology sector, including Tessera Technologies Hungary Kft. and Vishay Sprague, Inc. His experience in these organizations has been instrumental in shaping his inventive approach and deepening his understanding of semiconductor applications.

Collaborations

Katraro has collaborated with notable professionals in the field, including Charles Linder and Mara Nemas. These partnerships have fostered a collaborative environment that has led to the development of advanced technologies and innovative solutions in the semiconductor industry.

Conclusion

Reuven Katraro exemplifies the spirit of innovation through his ongoing contributions to semiconductor technology. His inventive work not only underlines his expertise but also portrays the significant impact that dedicated inventors can have on advancing modern technology. As he continues to explore new frontiers, the legacy of his patents will undoubtedly influence future developments in electronic devices.

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