Company Filing History:
Years Active: 2020-2025
Title: Rei Ibuka: Innovator in Substrate Processing Technology
Introduction
Rei Ibuka is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative work has advanced the capabilities of various processing methods and apparatuses.
Latest Patents
Ibuka's latest patents include a substrate processing apparatus and a substrate temperature correction method. The substrate processing apparatus features a placing table with a placing surface and a flow path for a temperature control medium. This design allows for precise temperature management during substrate processing. The substrate temperature correction method involves controlling the pressure of a heat transfer gas to mitigate temperature changes in the substrate, ensuring consistent processing results.
Another significant patent is a plasma processing method and apparatus. This method involves plasma-processing a substrate while utilizing a coolant at or below 0°C. It also includes a unique approach to removing reaction products generated during plasma processing, enhancing the efficiency of the overall process.
Career Highlights
Rei Ibuka has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in substrate processing.
Collaborations
Ibuka has collaborated with notable colleagues such as Dai Igarashi and Muneyuki Omi. Their combined expertise has fostered a creative environment that has led to groundbreaking developments in their field.
Conclusion
Rei Ibuka's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patents and collaborative efforts continue to influence advancements in this critical area of technology.