Eindhoven, Netherlands

Raymond Laurentius Johannes Schrijver


Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 15(Granted Patents)


Location History:

  • Veldhoven, NL (2007)
  • Eindhoven, NL (2004 - 2008)

Company Filing History:


Years Active: 2004-2008

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4 patents (USPTO):Explore Patents

Title: Raymond Laurentius Johannes Schrijver: Pioneering Innovations in Lithographic Apparatus

Introduction:

Raymond Laurentius Johannes Schrijver, a distinguished inventor based in Eindhoven, Netherlands, is making significant contributions to the field of lithographic apparatus. With an impressive track record of 4 patents, Schrijver is revolutionizing the technology landscape with his groundbreaking inventions.

Latest Patents:

Schrijver's latest patents showcase his expertise and creativity in the realm of lithographic apparatus and device manufacturing methods. One of his patents involves a unique approach where a mask table can accommodate a mask in multiple positions, enabling the imaging of patterns larger than the exposure field. This innovation allows for more efficient and precise imaging processes in lithography.

Another notable patent by Schrijver focuses on the impact of a pellicle in the optical path of a projection system, causing a virtual shift in the position of the pattern plane on the reticle. To address this challenge, Schrijver's invention introduces a compensator that counteracts the virtual shift, ensuring proper focusing of the projection image. These patents reflect Schrijver's commitment to pushing the boundaries of technology in the manufacturing sector.

Career Highlights:

Raymond Laurentius Johannes Schrijver is an esteemed member of the research and development team at ASML Netherlands B.V., a leading company in the semiconductor industry. His role at ASML involves spearheading innovative projects and driving advancements in lithographic technology. Schrijver's dedication to his work and his passion for innovation have earned him recognition as a key player in the company's success.

Collaborations:

Schrijver's collaborations with talented peers such as Albert Johannes Maria Jansen and Marcel Koenraad Marie Baggen have been instrumental in the development of cutting-edge technologies. Together, they form a dynamic team that combines expertise, creativity, and vision to drive innovation forward. The synergy among these innovators has led to the creation of groundbreaking solutions that address complex challenges in the industry.

Conclusion:

Raymond Laurentius Johannes Schrijver's inventive spirit and technical prowess have positioned him as a trailblazer in the field of lithographic apparatus. His latest patents represent the culmination of years of expertise and dedication to driving technological advancements. With a strong focus on innovation and collaboration, Schrijver continues to shape the future of technology and set new standards for excellence in the industry.

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