The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Dec. 19, 2003
Albert Johannes Maria Jansen, Bladel, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Raymond Laurentius Johannes Schrijver, Veldhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Johannes Jacobus Matheus Baselmans, Orischot, NL;
Willem Richard Pongers, Orischot, NL;
Tammo Uitterdijk, De Bilt, NL;
Albert Johannes Maria Jansen, Bladel, NL;
Marcel Koenraad Marie Baggen, Nuenen, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Raymond Laurentius Johannes Schrijver, Veldhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Johannes Jacobus Matheus Baselmans, Orischot, NL;
Willem Richard Pongers, Orischot, NL;
Tammo Uitterdijk, De Bilt, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.