The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2008
Filed:
Jan. 29, 2004
Applicants:
Albert Johannes Maria Jansen, Bladel, NL;
Jan Jaap Kuit, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Raymond Laurentius Johannes Schrijver, Eindhoven, NL;
Inventors:
Albert Johannes Maria Jansen, Bladel, NL;
Jan Jaap Kuit, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Raymond Laurentius Johannes Schrijver, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.