The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
May. 08, 2002
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Raymond Laurentius Johannes Schrijver, Eindhoven, NL;
Johannes Andreas Henricus Maria Jacobs, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Franciscus Koppelaars, Oisterwijk, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Raymond Laurentius Johannes Schrijver, Eindhoven, NL;
Johannes Andreas Henricus Maria Jacobs, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Franciscus Koppelaars, Oisterwijk, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of Nis provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.