Location History:
- Carmel, IN (US) (2009 - 2016)
- Westborough, MA (US) (2013 - 2016)
Company Filing History:
Years Active: 2009-2016
Title: Innovations of Raymond Chan
Introduction
Raymond Chan is a notable inventor based in Westborough, MA, with a significant contribution to the field of chemical solutions for substrate processing. He holds a total of seven patents, showcasing his expertise and innovative approach in developing effective removal solutions for photoresists.
Latest Patents
One of his latest patents is titled "Dynamic multi-purpose composition for the removal of photoresists and method for its use." This patent focuses on solutions and processes designed to remove substances from substrates, including photoresist. The solutions comprise dimethylsulfoxide, a quaternary ammonium hydroxide, an alkanolamine, and less than 3% by weight water of the total weight of the solution. The quaternary ammonium hydroxide can include compounds such as tetramethylammonium hydroxide, dimethyldipropylammonium hydroxide, or methyltriethylammonium hydroxide. Additionally, the solutions may incorporate a secondary solvent, such as an alcohol or ethylene glycol. Another patent by Chan describes methods for using improved stripper solutions that contain dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine with specific structural features. These stripper solutions are effective for removing photoresists from substrates and typically exhibit freezing points below about +15°C and high loading capacities.
Career Highlights
Raymond Chan has worked with prominent companies in the industry, including Dynaloy, LLC and Rohm & Haas Electronic Materials LLC. His experience in these organizations has contributed to his development of innovative solutions in the field of photoresist removal.
Collaborations
Throughout his career, Chan has collaborated with notable colleagues, including Michael Tod Phenis and Kimberly Dona Pollard. These partnerships have likely enhanced his research and development efforts in creating effective chemical solutions.
Conclusion
Raymond Chan's contributions to the field of chemical solutions for substrate processing are significant, as evidenced by his seven patents and collaborations with industry professionals. His innovative approaches continue to impact the effectiveness of photoresist removal processes.