The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2013

Filed:

Jun. 24, 2009
Applicants:

Kimberly Dona Pollard, Anderson, IN (US);

John M. Atkinson, Zionsville, IN (US);

Raymond Chan, Westborough, MA (US);

Michael T. Phenis, Markleville, IN (US);

Allison C. Rector, Indianapolis, IN (US);

Donald Pfettscher, Brownsburg, IN (US);

Inventors:

Kimberly Dona Pollard, Anderson, IN (US);

John M. Atkinson, Zionsville, IN (US);

Raymond Chan, Westborough, MA (US);

Michael T. Phenis, Markleville, IN (US);

Allison C. Rector, Indianapolis, IN (US);

Donald Pfettscher, Brownsburg, IN (US);

Assignee:

Dynaloy, LLC, Kingsport, TN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 (2006.01); G03F 7/32 (2006.01); C11D 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

Back end of line (BEOL) stripping solutions which can be used in a stripping process that replaces etching resist ashing process are provided. The stripping solutions are useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits with good efficiency and with low and acceptable metal etch rates. Methods for their use are similarly provided. The preferred stripping agents contain a polar aprotic solvent, water, an amine and a quaternary hydroxide that is not tetramethylammonium hydroxide. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods.


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