Brownsburg, IN, United States of America

Donald James Pfettscher

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Brownsburg, IN (US) (2013 - 2016)
  • Martinsville, IN (US) (2017)

Company Filing History:


Years Active: 2013-2017

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4 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Donald James Pfettscher**

Introduction

Donald James Pfettscher is an accomplished inventor based in Brownsburg, Indiana, with a notable record of four patents in the field of substrate processing. His work primarily focuses on developing solutions and processes aimed at removing various substances from substrates, particularly in the semiconductor industry. His innovative contributions are significant in enhancing manufacturing processes and improving the performance of semiconductor devices.

Latest Patents

Pfettscher's latest patents include advanced formulations and methods specifically tailored for substrate cleaning. One of his significant patents is titled "Solutions and processes for removing substances from substrates." This disclosure pertains to solutions incorporating a combination of quaternary ammonium hydroxide, multiple amines, and a specific formulation that limits the amine content to about 95% by weight of the solution. Notably, this solution is designed to exclude polar solvents other than water, ensuring a dynamic viscosity that does not exceed 60 centipoise.

Another recent patent is for "Aqueous solution and process for removing substances from substrates." This patent details a solution that contains hydrogen peroxide at a concentration not greater than 15% by weight, along with a quaternary ammonium hydroxide and water. This innovative formulation allows for effective removal of substances from semiconductor wafers and can be employed on both sides of the substrate to enhance cleaning efficiency.

Career Highlights

Pfettscher currently works at Dynaloy, LLC, a recognized leader in specialty chemicals dedicated to cleaning solutions for the semiconductor industry. His career is marked by a commitment to innovation and excellence, which is reflected in the multiple patents he holds. Throughout his professional journey, he has contributed to enhancing processes that improve the manufacturing of semiconductor devices.

Collaborations

In his endeavors, Pfettscher collaborates with notable colleagues, including Kimberly Dona Pollard and Michael Tod Phenis. These collaborations foster an environment of creativity and innovation, allowing the team to develop efficient solutions that address complex challenges in substrate processing.

Conclusion

Donald James Pfettscher stands out as a prominent inventor in the field of semiconductor substrate processing, making significant strides with his patented innovations. His work at Dynaloy, LLC reflects a dedication to advancing technology and processes that enhance the efficiency of semiconductor manufacturing. With his focus on removing substances from substrates, Pfettscher continues to contribute to a field that is vital to modern technology.

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