The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Sep. 27, 2013
Dynaloy, Llc, Kingsport, TN (US);
Richard Dalton Peters, Westfield, IN (US);
Travis W. Acra, Ingalls, IN (US);
Yuanmei Cao, Indianapolis, IN (US);
Nichelle Maria Gilbert, Fishers, IN (US);
Michael Tod Phenis, Markleville, IN (US);
Kimberly Dona Pollard, Anderson, IN (US);
Joshua Cummins, Indianapolis, IN (US);
Meng Guo, Indianapolis, IN (US);
Donald James Pfettscher, Brownsburg, IN (US);
Dynaloy, LLC, Kingsport, TN (US);
Abstract
The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include hydrogen peroxide in an amount that is no greater than 15% by weight of the total weight of the solution. The solution can also include a quaternary ammonium hydroxide and water. Further, the solution can include an amine, a co-solvent, or both. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the solution.