Indianapolis, IN, United States of America

Meng Guo

USPTO Granted Patents = 1 

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Meng Guo and His Innovations in Substrate Processing

Introduction

Meng Guo, based in Indianapolis, Indiana, is a skilled inventor known for his significant contributions to the field of substrate processing. His work primarily revolves around the development of solutions that enhance the efficiency and effectiveness of removing substances from various substrates, particularly in semiconductor technology.

Latest Patents

Meng holds one patent titled "Aqueous solution and process for removing substances from substrates." This innovation focuses on solutions and processes designed to eliminate undesired elements from substrates, with a notable application in removing photoresist from semiconductor wafers. The patent details a solution that incorporates hydrogen peroxide, maintaining a concentration of no greater than 15% by weight. Additionally, it includes a quaternary ammonium hydroxide, water, and potentially an amine or co-solvent to optimize the removal process. The solution can be applied to contact one or more sides of the substrate for effective substance elimination.

Career Highlights

Meng Guo is a prominent figure at Dynaloy, LLC, where he applies his expertise in innovative chemical solutions for substrate processing. His role in the development of effective cleaning agents has made profound impacts in semiconductor manufacturing and other relevant industries. The success of his patent underscores his commitment to research and development in this critical field.

Collaborations

In his professional endeavors, Meng collaborates closely with esteemed colleagues, including Richard Dalton Peters and Travis W. Acra. Their collaborative efforts further enhance the innovative environment at Dynaloy, LLC, leading to noteworthy advancements in substrate technology.

Conclusion

Meng Guo continues to be a significant contributor to the field of invention, particularly in the domain of aqueous solutions for substrate processing. His dedication to innovation, partnership with skilled professionals, and successful patent illustrate his role as a vital inventor in the semiconductor industry. As technologies evolve, the contributions of inventors like Meng will undoubtedly propel further advancements forward.

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