The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Oct. 15, 2012
Applicant:
Dynaloy, Llc, Kingsport, TN (US);
Inventors:
Kimberly Dona Pollard, Anderson, IN (US);
Donald Pfettscher, Brownsburg, IN (US);
Meagan Hatfield, Indianapolis, IN (US);
Spencer Erich Hochstetler, Kingsport, TN (US);
Nichelle M. Wheeler, Fishers, IN (US);
Michael T. Phenis, Markleville, IN (US);
Assignee:
Dynaloy, LLC, Kingsport, TN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/72 (2006.01); C11D 3/04 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); C11D 3/44 (2006.01); C11D 3/43 (2006.01); C11D 3/34 (2006.01); C11D 11/00 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
C11D 1/72 (2013.01); C11D 3/43 (2013.01); C11D 3/2024 (2013.01); C11D 3/044 (2013.01); C11D 3/2068 (2013.01); C11D 3/30 (2013.01); C11D 3/3445 (2013.01); C11D 11/0047 (2013.01); G03F 7/426 (2013.01); G03F 7/425 (2013.01);
Abstract
A photoresist and post etch cleaning solution for semiconductor wafers comprising:
Quick Actions:
Pollard, Kimberly. (2015). Photoresist and post etch residue cleaning solution (U.S. Patent No. 8987181). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8987181
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile