Berlin, Germany

Ray Weinhold


 

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Nürnberg, DE (2015 - 2017)
  • Berlin, DE (2019 - 2020)

Company Filing History:


Years Active: 2015-2020

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6 patents (USPTO):Explore Patents

Title: Ray Weinhold: Innovator in Wafer Processing Technologies

Introduction

Ray Weinhold is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of wafer processing, holding a total of 6 patents. His innovative approaches have advanced the technology used in substrate processing and metal deposition.

Latest Patents

One of Ray Weinhold's latest patents is a "Wafer-like substrate processing method and apparatus." This invention refers to a method for processing a wafer-like substrate using both a touching gripper and a touchless gripper. The apparatus designed for this purpose includes these two types of grippers, enhancing the efficiency of wafer processing. Another significant patent is for a "Device for vertical galvanic metal deposition on a substrate." This device comprises two vertically arranged devices, with the first device featuring an anode and a carrier that are interconnected. The design allows for effective treatment of substrates, showcasing Ray's innovative engineering skills.

Career Highlights

Ray has worked with Atotech Deutschland GmbH and Atotech Deutschland GmbH & Co. KG, where he has applied his expertise in developing advanced technologies for substrate processing. His work in these companies has contributed to the growth and innovation in the field.

Collaborations

Throughout his career, Ray has collaborated with notable professionals such as Ralph Rauenbusch and Christian Thomas. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Ray Weinhold's contributions to wafer processing technologies and his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in substrate processing and galvanic metal deposition.

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