The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Dec. 03, 2013
Applicant:
Atotech Deutschland Gmbh, Berlin, DE;
Inventors:
Ralph Rauenbusch, Burgthann, DE;
Christian Thomas, Erlangen, DE;
Ray Weinhold, Nürnberg, DE;
Heinz Klingl, Neusäβ, DE;
Assignee:
Atotech Deutschland GmbH, Berlin, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/00 (2006.01); C25D 17/12 (2006.01); C25D 17/06 (2006.01); C25D 7/12 (2006.01); C25D 5/08 (2006.01);
U.S. Cl.
CPC ...
C25D 17/001 (2013.01); C25D 17/004 (2013.01); C25D 17/06 (2013.01); C25D 17/12 (2013.01); C25D 5/08 (2013.01); C25D 7/123 (2013.01);
Abstract
The present invention is related to a device for vertical galvanic metal, preferably copper, deposition on a substrate, a container suitable for receiving such a device and a substrate holder, which is suitable for receiving a substrate to be treated, and the use of such a device inside of such a container for galvanic metal, in particular copper, deposition on a substrate.