Hsinchu, Taiwan

Ramakrishnan Krishnan


Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 2013-2016

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4 patents (USPTO):Explore Patents

Title: Ramakrishnan Krishnan: Innovator in E-beam Lithography and Pulse Width Measurement

Introduction

Ramakrishnan Krishnan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the fields of e-beam lithography and pulse width measurement, holding a total of 4 patents. His innovative work has implications for various technological advancements.

Latest Patents

One of his latest patents is titled "E-beam lithography with alignment gating." This patent describes a reflective electron-beam lithography system that includes an e-beam source, a digital pattern generator (DPG), a substrate stage, an e-beam lens module, and an alignment gate. The system is designed to enhance the precision of e-beam lithography by modulating the intensity of the e-beam.

Another significant patent is the "Circuit and method for pulse width measurement." This invention comprises a charging circuit, a comparator, and a determining circuit. The charging circuit charges a capacitive device in response to a periodic signal, while the comparator compares the voltage across the capacitor with a reference voltage level. The determining circuit then counts the number of pulses of the periodic signal based on the comparator's output.

Career Highlights

Ramakrishnan has worked with prominent organizations, including Taiwan Semiconductor Manufacturing Company Ltd. and The Penn State Research Foundation. His experience in these companies has allowed him to develop and refine his innovative ideas.

Collaborations

He has collaborated with notable colleagues such as Nan-Hsin Tseng and Sang Hoo Dhong, contributing to the advancement of technology in his field.

Conclusion

Ramakrishnan Krishnan's contributions to e-beam lithography and pulse width measurement highlight his role as an influential inventor. His patents reflect a commitment to innovation and technological progress.

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