San Jose, CA, United States of America

Ram S Ramanujam

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 159(Granted Patents)


Location History:

  • San Jose, CA (US) (2008)
  • Santa Cruz, CA (US) (2008 - 2009)

Company Filing History:


Years Active: 2008-2009

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4 patents (USPTO):Explore Patents

Title: Ram S Ramanujam: Innovator in Semiconductor Technology

Introduction

Ram S Ramanujam is a notable inventor based in San Jose, California, with a focus on advancements in semiconductor technology. He holds a total of four patents that contribute significantly to the field of lithography and optical proximity correction.

Latest Patents

His latest patents include a method for verifying and choosing lithography models. This innovation involves a test mask that incorporates both verification and calibration structures, enabling the formation of images under various conditions. This allows for the measurement of calibration structures and the development of computational models for optical proximity correction purposes. Another significant patent is related to calibration on wafer sweet spots. This method generates an OPC model that accounts for across-wafer variations during semiconductor chip manufacturing, ensuring accuracy based on test patterns measured at optimal locations.

Career Highlights

Throughout his career, Ramanujam has worked with prominent companies such as Invarium, Inc. and Cadence Design Systems, Inc. His contributions have been instrumental in enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable professionals in the industry, including Franz X Zach and Roy Varada Prasad. These partnerships have further enriched his work and innovations in the field.

Conclusion

Ram S Ramanujam's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant innovator in the industry. His work continues to influence advancements in lithography and optical proximity correction.

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