Brewster, NY, United States of America

Rajiv M Ranade


Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 306(Granted Patents)


Location History:

  • Beacon, NY (US) (2004)
  • Fishkill, NY (US) (1999 - 2006)
  • Brewster, NY (US) (2001 - 2013)

Company Filing History:


Years Active: 1999-2013

where 'Filed Patents' based on already Granted Patents

20 patents (USPTO):

Title: Innovations and Contributions of Rajiv M. Ranade

Introduction

Rajiv M. Ranade, based in Brewster, NY, is a distinguished inventor known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 20 patents, Rajiv has demonstrated his expertise and dedication to advancing innovative solutions that enhance semiconductor fabrication processes.

Latest Patents

Among his recent inventions is the patent titled "Use of an Organic Planarizing Mask for Cutting a Plurality of Gate Lines." This invention involves forming an organic planarizing layer (OPL) atop a semiconductor substrate with multiple gate lines. Each gate line incorporates a high-k gate dielectric and a metal gate. The innovative process includes positioning a patterned photoresist layer, which is meticulously designed with patterns perpendicular to the gate lines. Through a detailed etching process, the pattern is transferred into the OPL and underlying gate lines, resulting in a series of gate stacks. The methodology concludes with a specified sequence of chemical treatments for removing the patterned photoresist and remaining OPL, showcasing Rajiv's expertise in semiconductor processing.

Career Highlights

Rajiv has enjoyed a fruitful career, having worked with prominent companies such as International Business Machines Corporation (IBM) and Infineon Technologies AG. His time at these leading technology firms has allowed him to refine his skills and collaborate on several cutting-edge projects in the semiconductor field.

Collaborations

Throughout his career, Rajiv has collaborated with notable colleagues, including Gangadhara Swami Mathad and Kevin K. Chan. These partnerships have fostered an environment of innovation and creativity, contributing to the development of advanced technologies that push the boundaries of semiconductor applications.

Conclusion

Rajiv M. Ranade continues to be a prominent figure in the realm of semiconductor innovations. His achievements, particularly his recent patents, reflect his commitment to enhancing technology within the industry. As he continues to forge new paths in semiconductor fabrication, his work will undoubtedly influence future innovations in the field.

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