Plano, TX, United States of America

Rajasekhar Reddy Allu

USPTO Granted Patents = 40 

 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2017-2025

where 'Filed Patents' based on already Granted Patents

40 patents (USPTO):

Title: Innovator Spotlight: Rajasekhar Reddy Allu

Introduction: Rajasekhar Reddy Allu is a prolific inventor based in Plano, TX, with an impressive portfolio of 35 patents. His work primarily focuses on advancements in image processing and error handling in geometric correction engines, significantly contributing to technological innovation in the field.

Latest Patents: Among Rajasekhar's latest patents is a method for error handling in a geometric correction engine (GCE). This invention outlines how the GCE receives configuration parameters, generates output blocks of a frame, detects run-time errors during generation, and subsequently reports corresponding events. Another notable patent involves an integrated circuit designed for multi-application image processing. This integrated circuit includes various image processing blocks, data selection circuitry, and a pipeline memory, demonstrating Rajasekhar’s expertise in complex circuitry and data management.

Career Highlights: Rajasekhar is currently employed at Texas Instruments Corporation, a leading firm in the semiconductor and electronics industry. His contributions have played a significant role in enhancing the functionality and reliability of image processing technologies.

Collaborations: Throughout his career, Rajasekhar has collaborated with skilled professionals including Mihir Narendra Mody and Niraj Nandan. Their joint efforts have led to groundbreaking advancements in their respective fields, fostering an environment of innovation and creativity.

Conclusion: Rajasekhar Reddy Allu exemplifies the spirit of innovation with his extensive array of patents and dedication to advancing technology. His contributions at Texas Instruments Corporation and collaborations with notable colleagues highlight his significant impact on the industry and pave the way for future innovations.

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