Wappingers Falls, NY, United States of America

Rainer F Schnabel

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.4

ph-index = 6

Forward Citations = 150(Granted Patents)


Location History:

  • Wappinger Falls, NY (US) (2001)
  • Wappingers Falls, NY (US) (1999 - 2002)

Company Filing History:


Years Active: 1999-2002

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovator Profile: Rainer F Schnabel

Introduction:

Rainer F Schnabel, an accomplished inventor in the field of semiconductor technology, hails from Wappingers Falls, NY, US. With a notable portfolio of 9 patents to his name, Schnabel has made significant contributions to the advancement of integrated circuit manufacturing processes.

Latest Patents:

1. "Dummy patterns for aluminum chemical polishing (CMP)": Schnabel's innovative method and apparatus aim to achieve planarization of damascene metallic circuit patterns on silicon wafers. By incorporating dummy circuitry in the damascene process, the invention ensures a uniform circuit density over the wafer surface, enhancing the overall quality and performance of integrated circuits.

2. "Method of forming multi-level coplanar metal/insulator films using dual damascene with sacrificial flowable oxide": This patent introduces an improved technique for etching through a layer stack, facilitating the formation of vias in semiconductor devices. By utilizing a dual damascene approach with sacrificial flowable oxide, Schnabel's method optimizes the manufacturing process and enhances device reliability.

Career Highlights:

Schnabel has showcased his expertise at renowned companies such as Siemens Aktiengesellschaft and IBM (International Business Machines Corporation). His tenure at these industry leaders has been marked by groundbreaking research and innovative solutions in semiconductor engineering.

Collaborations:

Throughout his career, Schnabel has collaborated with top professionals in the field, including esteemed colleagues like Mark A Jaso and Xian J Ning. Together, they have spearheaded projects, shared insights, and collectively pushed the boundaries of technological innovation in the semiconductor sector.

Conclusion:

In conclusion, Rainer F Schnabel stands out as a visionary inventor whose trailblazing work has transformed the landscape of integrated circuit manufacturing. With a keen eye for detail and a passion for excellence, Schnabel continues to drive progress in the industry, shaping the future of semiconductor technologies.

Would you like to explore more inventors and their remarkable contributions in the field of innovations and patents?

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