Raghunath Putikam

Title: Raghunath Putikam: Innovator in Semiconductor Technology

Introduction

Raghunath Putikam is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices.

Latest Patents

One of his latest patents is titled "Selective dual silicide formation." This patent describes techniques that enable the formation of different types of metal silicide layers for p-type and n-type source/drain regions in a selective manner. For instance, a p-type metal silicide layer can be selectively formed over a p-type source/drain region, while an n-type metal silicide layer is formed over the n-type source/drain region. This innovation results in a low Schottky barrier height, reducing contact resistance for both types of regions.

Another significant patent is "Semiconductor device and manufacturing method thereof." This method involves forming a fin structure with alternating layers of first and second semiconductor materials over a substrate. The process includes creating a dummy gate structure, selectively etching the first semiconductor layers, and forming source/drain epitaxial structures. This method enhances the overall performance and manufacturability of semiconductor devices.

Career Highlights

Raghunath Putikam has worked with prominent companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company and TSMC Nanjing Company, Limited. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Raghunath has collaborated with esteemed colleagues such as Wei-Yip Loh and Yan-Ming Tsai. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a culture of innovation within the industry.

Conclusion

Raghunath Putikam is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patents reflect a commitment to innovation and efficiency, making him a valuable contributor to the industry.