Portland, OR, United States of America

Ragesh Puthenkovilakam

This inventor holds 4 USPTO granted patents and 14 published patent applications. Top assignee: Lam Research Corporation. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ragesh Puthenkovilakam. Retrieved from https://idiyas.com/inventor/ragesh-puthenkovilakam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2026

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4 patents (USPTO):Explore Patents

Title: Ragesh Puthenkovilakam: Innovator in Semiconductor Technology

Introduction

Ragesh Puthenkovilakam is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of hard masks used in semiconductor processing.

Latest Patents

One of his latest patents is titled "Inert gas implantation for hard mask selectivity improvement." This invention involves the formation of an amorphous carbon hard mask that has low hydrogen content and low sp3 carbon bonding, yet exhibits high modulus and hardness. The process includes depositing an amorphous carbon layer at low temperatures in a plasma deposition chamber, followed by a dual plasma-thermal treatment. This treatment exposes the amorphous carbon layer to inert gas plasma, implanting an inert gas species, and then subjecting it to high temperatures. The resulting amorphous carbon hard mask demonstrates high etch selectivity relative to underlying materials.

Another significant patent is "High density, modulus, and hardness amorphous carbon films at low pressure." This patent outlines methods and apparatus for depositing an ashable hard mask (AHM) on a substrate within a low-pressure chamber using a dual frequency radio frequency component. The use of low-pressure plasma enhanced chemical vapor deposition enhances the etch selectivity of the AHM, allowing for the application of a thinner AHM in semiconductor processing operations.

Career Highlights

Ragesh Puthenkovilakam is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His innovative work has positioned him as a key player in advancing semiconductor technologies.

Collaborations

He has collaborated with notable colleagues, including Matthew Scott Weimer and Pramod Subramonium, contributing to various projects that enhance semiconductor processing techniques.

Conclusion

Ragesh Puthenkovilakam's contributions to semiconductor technology through his patents and work at Lam Research Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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