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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11837441 B1

PDFFull Text
Date of Patent:
Dec. 05, 2023

Filed:

May. 28, 2020

Depositing a carbon hardmask by high power pulsed low frequency rf

Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Matthew Scott Weimer, Portland, OR (US);

Pramod Subramonium, Portland, OR (US);

Ragesh Puthenkovilakam, Portland, OR (US);

Rujun Bai, Tigard, OR (US);

David French, Fort Myers, FL (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:

Weaver Austin Villeneuve & Sampson LLP

Primary Examiner:

Bret P Chen

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/517 (2006.01); C23C 16/52 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32146 (2013.01); C23C 16/517 (2013.01); C23C 16/52 (2013.01); H01J 37/32174 (2013.01); H01L 21/0272 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate include pulsing a low frequency radio frequency component at a high power. Pulsing low frequency power may be used to increase the selectivity or reduce the stress of an AHM. The AHM may then be used to etch features into underlying layers of the substrate.

Find Patent Forward Citations

Weimer, Matthew. (2023). Depositing a carbon hardmask by high power pulsed low frequency rf (U.S. Patent No. 11837441). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11837441

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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