Quang N Tran

Title: The Innovative Contributions of Quang N Tran

Introduction

Quang N Tran is a notable inventor based in San Jose, California. He has made significant contributions to the field of physical vapor deposition processing, holding a total of four patents. His work focuses on advanced magnetron designs that enhance the efficiency and effectiveness of various applications.

Latest Patents

One of his latest patents is titled "Multifocal magnetron design for physical vapor deposition processing on a single cathode." This invention features an apparatus with a keeper plate and an annular magnet array that work together to create a magnetic field environment. This environment is crucial for plasma confinement of ionizing electrons, which allows a reactive gas and sputter gas to become ionized. The ionized gas is then directed to a target cathode, facilitating the ionization of sputtered species across a substrate.

Another significant patent by Quang N Tran is also titled "Multifocal magnetron design for physical vapor deposition processing on a single cathode." This apparatus includes a cathode target and an inner magnet array that is strategically designed to optimize the magnetic orientations. The innovative design aims to improve the performance of physical vapor deposition processes, showcasing Tran's expertise in the field.

Career Highlights

Quang N Tran has worked with several prominent companies throughout his career, including Hia, Inc. and Advanced Micro Devices Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the industry.

Collaborations

Quang N Tran has collaborated with several talented individuals, including Samuel Dacke Harkness, Iv, and Khoi A Phan. These collaborations have further enriched his work and led to innovative advancements in his field.

Conclusion

Quang N Tran's contributions to the field of physical vapor deposition processing are noteworthy. His innovative patents and collaborations reflect his dedication to advancing technology. His work continues to influence the industry and inspire future innovations.