The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Mar. 09, 2016
Applicant:
Hia, Inc., Milpitas, CA (US);
Inventors:
Samuel D. Harkness, IV, Albany, CA (US);
Quang N. Tran, San Jose, CA (US);
Assignee:
HIA, Inc., Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3417 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C23C 14/3464 (2013.01); C23C 14/3478 (2013.01); C23C 14/352 (2013.01); C23C 14/355 (2013.01); H01J 37/345 (2013.01); H01J 37/3426 (2013.01); H01J 37/3452 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01);
Abstract
An apparatus has a primary cathode configured for free space interaction with a substrate operative as an anode. A first annular cathode faces a second annular cathode. The primary cathode, the first annular cathode, the second annular cathode are axially aligned. The outer diameters of the first annular cathode and the second annular cathode correspond to the outer diameter of the primary cathode. The primary cathode provisions deposited material on the substrate with controllable plasma density to levels above 1×10m, with ignition capability above 0.05 Pa.