The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Aug. 23, 2022
Applicant:

Intevac, Inc., Santa Clara, CA (US);

Inventors:

Samuel D. Harkness, Iv, Albany, NY (US);

Quang N. Tran, San Jose, CA (US);

Assignee:

INTEVAC, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2005.12); C23C 14/34 (2005.12); C23C 14/35 (2005.12);
U.S. Cl.
CPC ...
H01J 37/345 (2012.12); C23C 14/3407 (2012.12); C23C 14/35 (2012.12); C23C 14/355 (2012.12); H01J 37/3405 (2012.12); H01J 37/3414 (2012.12); H01J 37/3435 (2012.12); H01J 37/3452 (2012.12); H01J 37/3461 (2012.12);
Abstract

An apparatus has a keeper plate with a keeper plate outer perimeter. An annular magnet array with an annular magnet array outer perimeter is coincident with the keeper plater outer perimeter. An inner top magnet is positioned on a centerline of a first side of the keeper plate and an inner bottom magnet is positioned on the centerline of a second side of the keeper plate. The inner top magnet is of a first magnetic orientation and the annular magnet array and the inner bottom magnet have a second magnetic orientation opposite the first magnetic orientation to form a magnetic field environment that provides plasma confinement of ionizing electrons which causes a gas operative as a reactive gas and sputter gas to become ionized and subsequently be directed to a target cathode while simultaneously causing the ionization of sputtered species which are dispersed across a substrate.


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