Preetham Prahallada Rao

Title: Innovations by Preetham Prahallada Rao

Introduction

Preetham Prahallada Rao is an accomplished inventor based in Morgan Hill, CA. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is titled "Virtual measurement of conditions proximate to a substrate with physics-informed compressed sensing." This method involves measuring a subset of property values within a manufacturing chamber during a process performed on a substrate. It further includes determining property values at locations removed from the measurement points and performing corrective actions based on these determined properties. Another notable patent is the "Chamber injector," which relates to apparatus for fabricating semiconductor devices. This invention features a gas injection apparatus that is coupled to two gas sources, ensuring that the gases remain separated until they enter the process volume. A coolant flows through a channel in the gas injection apparatus to cool the gases, preventing thermal decomposition by mitigating thermal radiation from the process chamber.

Career Highlights

Preetham is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on enhancing manufacturing processes and improving the efficiency of semiconductor devices.

Collaborations

He collaborates with talented coworkers, including Prashanth Kothnur and Shu-Kwan Danny Lau, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Preetham Prahallada Rao's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in the field. His work continues to influence the manufacturing processes that are vital to the advancement of technology.