Praburam Gopal Raja

Title: Innovations of Praburam Gopal Raja

Introduction

Praburam Gopal Raja is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly in the area of plasma deposition methods. With a total of 3 patents, his work has advanced the capabilities of manufacturing processes for electronic devices.

Latest Patents

Raja's latest patents include innovative methods and apparatus for producing low angle depositions. This technology involves a plasma chamber that utilizes a three-dimensional (3D) magnetron with a sputtering target. The design allows for selective plasma deposition on a substrate, enhancing the efficiency of the manufacturing process. Another significant patent focuses on PVD buffer layers for LED fabrication. This patent describes the fabrication of gallium nitride-based light devices using physical vapor deposition (PVD) to form aluminum nitride buffer layers. The process conditions and substrate pretreatments for creating these layers are also detailed, showcasing Raja's expertise in the field.

Career Highlights

Praburam Gopal Raja is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has positioned him as a key player in advancing technologies that are critical for modern electronics.

Collaborations

Raja has collaborated with notable colleagues such as Anantha K Subramani and Mingwei Zhu. These collaborations have further enriched his research and development efforts, leading to innovative solutions in semiconductor manufacturing.

Conclusion

Praburam Gopal Raja's contributions to the field of semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods for plasma deposition and LED fabrication continue to impact the industry positively.