The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2021
Filed:
Aug. 01, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Praburam Raja, San Jose, CA (US);
Steven V. Sansoni, Livermore, CA (US);
John Forster, Sunnyvale, CA (US);
Philip Kraus, San Jose, CA (US);
Yang Guo, Fremont, CA (US);
Prashanth Kothnur, San Jose, CA (US);
Farzad Houshmand, Mountain View, CA (US);
Bencherki Mebarki, Santa Clara, CA (US);
John Joseph Mazzocco, San Jose, CA (US);
Thomas Brezoczky, Los Gatos, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for low angle, selective plasma deposition on a substrate. A plasma chamber uses a process chamber having an inner processing volume, a three dimensional (3D) magnetron with a sputtering target with a hollow inner area that overlaps at least a portion of sides of the sputtering target and moves in a linear motion over a length of the sputtering target, a housing surrounding the 3D magnetron and the sputtering target such that at least one side of the housing exposes the hollow inner area of the sputtering target, and a linear channel interposed between the housing and a wall of the process chamber.